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Products
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ASML TwinScan XT:1400F Refurbished
TwinScan XT:1400F DUV Lithography, The XT:1400F is a dual-stage ArF lithography system designed for 200mm and 300mm wafers at 65nm resolution.
ASML TwinScan XT:1700Fi Refurbished
TwinScan XT:1700Fi DUV Lithography, A dual-stage ArF immersion DUV lithography system for high-volume manufacturing (HVM) of 300mm wafersproduction at 50nm resolution and below.
ASML TwinScan XT:1900Gi Refurbished
TwinScan XT:1900Gi DUV Lithography, A dual-stage ArF immersion DUV lithography system for high-volume manufacturing (HVM) of 300mm wafers.
ASML TwinScan XT:1950Hi Refurbished
TwinScan XT:1950Hi DUV Lithography, A dual-stage ArF immersion DUV lithography system for high-volume manufacturing (HVM) of 300mm wafers.
Nikon NSR-S208D Refurbished KrF Scanners
NSR-S208D Refurbished KrF Scanner uses a 248nm wavelength KrF excimer laser exposure source, equipped with a dual-stage system, supports high-efficiency, high-precision mass production of 6"/8" wafers.
Nikon NSR2205i12D Refurbished Steppers
NSR2205i12D refurbished i-line stepper uses a 365nm wavelength light source and with a dual-stage design, supports high-efficiency, high-precision mass production of 6"/8" wafers.
ABM SA Series TSV/BSV Mask Aligner System
SA Series TSV/BSV Mask Aligner System，6"、8"Exposure Lightsource for G-, H-, I-Line wavelength output Work with 2", 3" ,4", 6",8" (Round/Square substrate)
