Nikon NSR-S208D Refurbished KrF Scanners Specifications

The KrF Scanner uses a 248nm wavelength KrF excimer laser exposure source;

With Dual-Stage, Supports efficient and high-precision mass production of 6"/8" wafers;

Suitable for fabricating high-performance semiconductor devices, including microprocessors, dynamic random-access memory (DRAM), as well as complex logic and mixed-signal chips, etc.

● Wavelength:              248nm ;

● Numerical Aperture:      0.82 ;

● Resolution:                110nm ;

● Reduction ratio:               4:1 ;

● Exposure field:          26mm×33mm ;

● Overlay:                       15nm ;

● Throughput:       ≧ 147 wafers/hour ;