TwinScan XT:1700Fi DUV Lithography Specifications

A dual-stage ArF immersion DUV lithography system for high-volume manufacturing (HVM) of 300mm wafersproduction at 50nm resolution and below.

The XT:1700Fi features is a 1.2-NAin-line catadioptric lens.. 

● Wavelength: 193nm;

● Numerical Aperture: 0.75~1.20;

● Resolution: 45nm;

● CDU: 3nm;

● Single Machine Overlay: 7nm;

● Throughput: 122 wph (@125 exp per wafer);