TwinScan XT:1900Gi DUV Lithography Specifications

A dual-stage ArF immersion DUV lithography system for high-volume manufacturing (HVM) of 300mm wafers.

The XT:1950Hi features a Zeiss Starlith1950 immersion lens. 

This is the largest-NA ArF lens available and at 1.35 NA. it pushes water-based ArF immersion lithography to the limit.

● Wavelength: 193nm;

● Numerical Aperture:  ~1.35;

● Resolution: 38nm;

● CDU: 1nm;

● Single Machine Overlay: 4nm;

● Throughput: 148wph (@125 exp per wafer);