TwinScan XT:1900Gi DUV Lithography Specifications

A dual-stage ArF immersion DUV lithography system for high-volume manufacturing (HVM) of 300mm wafers.

The XT:1900Gi features a Zeiss Starlith1900i immersion lens. 

This is the largest-NA ArF lens available and at 1.35 NA.

● Wavelength: 193nm;

● Numerical Aperture: 0.85~1.35;

● Resolution: 40nm;

● CDU: 2.5nm;

● Single Machine Overlay: 6nm;

● Throughput: 131 wph (@125 exp per wafer);