TwinScan XT:1400F DUV Lithography Specifications

The XT:1400F is a dual-stage ArF lithography system designed for 200mm and 300mm wafers at 65nm resolution. 

It employs a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator.

The system ensures comprehensive focus control, especially on edge dies.

● Wavelength: 193nm;

● Numerical Aperture: 0.65~0.93;

● Resolution: 65nm;

● CDU: 6.5nm;

● Single Machine Overlay: 6nm;

● Throughput: 133 wph (@125 exp per wafer);