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Advantest E3650/E3640 Photomask CD-SEM

Advantest E3650/E3640 Photomask CD-SEM Specifications

 

Multidimensional observation and measurement SEM supporting photomasks at sub-10 nm nodes /1X nm nodes;

CD measurement is stable over a long period of time;

Large Field Measurement;

3D Observation.

 

● Mask Size:          6"(6025) ;

● Node:            10 nm、1Xnm ;