Advantest E3650/E3640 Photomask CD-SEM Specifications
Multidimensional observation and measurement SEM supporting photomasks at sub-10 nm nodes /1X nm nodes;
CD measurement is stable over a long period of time;
Large Field Measurement;
3D Observation.
● Mask Size: 6"(6025) ;
● Node: 10 nm、1Xnm ;