LAZIN LODAS-AI50/100/200 Photomask Blanks inspection system Specifications

For Photomask Blanks for Semiconductor Shipment Inspection, Process Evaluation;

Defect analysis by differential interference microscope;

Inspection target Photomask Substrate, Cr, Resist, MoSi;

Inspection items Particles, internal defects (Option).

● Mask Size:                        6"（6025）" ；

● Inspection Sensitivity:      PDM defect size 0.25um/0.10μm/0.08um ；