Tystar Tytan Standard LPCVD Specifications

The Tytan Standard Systems are designed for diffusion, oxidation and LPCVD applications. 

The systems are compact and suitable for use in manufacturing and/or R&D environment. 

The Standard series have been well accepted as dependable process tools both in the industry and in the R&D community. 

They offer superior performance and process uniformities. 

● Furnace Model:   2000 ~ 8300 ；

● Wafer Size:                   6" ~ 8" ；

● Tubes:                                ≤ 4 ；

● Wafer Per Tube(ATM):       200 ；

● Wafer Per Tube(LPCVD):   100 ；

● Flat Zone:                          34" ；