Tystar Tytan Mini LPCVD Specifications

The Tytan Mini Furnace Systems are designed for diffusion, oxidation and LPCVD applications. 

The systems require considerably less floor space and electrical power than conventional furnaces of equal capacity.

The Mini series have been well accepted as dependable process tools both in the semiconductor industry and in the R&D community.

They offer superior performance and process uniformities. 

● Furnace Model:    1600 ~ 4800 ；

● Wafer Size:                    4" ~ 8" ；

● Tubes:                                 ≤ 4 ；

● Wafer Per Tube(ATM):        100 ；

● Wafer Per Tube(LPCVD):     50  ；

● Flat Zone:                           18" ；